Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2

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Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma

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ژورنال

عنوان ژورنال: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

سال: 2018

ISSN: 0734-2101,1520-8559

DOI: 10.1116/1.5019170